Tag Archives: Wafer Annealing Furnace

The Application of Large-Diameter Tube Furnace in Wafer Annealing

Large-Diameter Tube Furnace for Wafer Annealing

Achieving precise temperature control, uniform heating, and a clean atmosphere is essential for the success of wafer annealing. This is where large-diameter tube furnaces play a vital role.
In this blog, we will discuss the role of large-diameter tube furnaces in wafer annealing, their key features, technical specifications, and the benefits they offer to the semiconductor industry.

Applications of Rapid Annealing Furnaces in Advanced Materials and Semiconductor Technology Research

Applications of Rapid Annealing Furnaces

Unlike conventional furnaces, RTA furnaces minimize thermal exposure, preventing undesirable diffusion effects while preserving material integrity. These furnaces operate at temperatures ranging from 200°C to over 1200°C, depending on the specific application.

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