Achieving precise temperature control, uniform heating, and a clean atmosphere is essential for the success of wafer annealing. This is where large-diameter tube furnaces play a vital role.
In this blog, we will discuss the role of large-diameter tube furnaces in wafer annealing, their key features, technical specifications, and the benefits they offer to the semiconductor industry.
Tag Archives: Wafer Annealing Furnace
Unlike conventional furnaces, RTA furnaces minimize thermal exposure, preventing undesirable diffusion effects while preserving material integrity. These furnaces operate at temperatures ranging from 200°C to over 1200°C, depending on the specific application.