Plasma-Enhanced Chemical Vapor Deposition (PECVD) furnaces are essential for thin-film deposition in industries such as semiconductors, optics, photovoltaics, and MEMS. Choosing the right PECVD furnace is crucial to achieving high-quality film coatings with precise control over deposition parameters.
Tag Archives: Low-Temperature PECVD Furnace
Chemical Vapor Deposition (CVD) technology is widely used in semiconductor manufacturing, optics, thin-film coatings, and material science. Within this technology, different types of CVD furnaces exist, including CVD, PECVD (Plasma-Enhanced CVD), and FBCVD (Fluidized Bed CVD).