The primary purpose of annealing is to improve the crystal quality of monocrystalline silicon, relieve internal stress, repair defects, and optimize its physical and electronic properties, thereby meeting the application requirements in the semiconductor and photovoltaic fields.
Tag Archives: Annealing Furnace
Laboratory, Thermal Processing
Which heat treatment equipment is commonly used in the semiconductor industry?
In the semiconductor industry, heat treatment equipment plays a crucial role in the manufacturing process, altering the physical and chemical properties of materials to meet various process requirements.
By understanding the types of electric furnaces available and their characteristics, laboratory personnel can select the best furnace for their specific application.
ZYLAB furnaces are designed with the latest technology and engineering to ensure precision and accuracy in the experiment process. The standard zylab furnace parameters and applications we provide are as follows: For Laboratory Temp Range Furnace Type Model Size(mm)/Capacity(L) Heating Zones Application 100-1200.C Muffle Furnace M1200-10IC 100*100*100/1 1 Ashing, Pre-heating, Burnout, Dewaxing, Testing, Analysis,etc M1200-15IT […]
Laboratory electric furnace is a type of heating device, used in scientific research, materials processing, and quality control applications. It use electricity to generate heat, which is then transferred to the sample through conduction, convection, or radiation. The Working Principle of Laboratory Electric Furnace The working principle of laboratory electric furnace, is convert electrical energy […]