Aerosol-Assisted Chemical Vapor Deposition (AACVD) is a specialized technique used for the deposition of thin films and coatings on various substrates. Unlike traditional Chemical Vapor Deposition (CVD), which relies solely on gaseous precursors, AACVD utilizes aerosols—finely dispersed droplets of a precursor solution suspended in a carrier gas—to transport the precursor materials to the deposition zone.
