Lab Ultrasonic Nebulizer for AACVD Experiment
Introduction
This Ultrasonic Nebulizer is an aerosol-assisted chemical vapor deposition (AACVD) device, utilizing liquid aerosols as precursors that grow on a substrate. It is designed for applications such as fuel cell production and the deposition of ZnO transparent conductive films. The instrument consists of two main modules: a high-precision micro-flow liquid transmission system and an ultrasonic atomization system. This technology is suitable for non-volatile precursors and can be widely applied in fields such as nanomaterial preparation and electrode material coating and composites.
Application Demonstration
Technical Specifications of Ultrasonic Nebulizer
Model | UA-0.36L |
Features | Infinitely adjustable liquid feed rate, carrier gas, and atomization power |
Maximum Volume | 360mL |
Atomization Particle Size | 5–10 μm |
Dimensions | Length 180 × Depth 210 × Height 260 mm |
Solution Injection Method | Variable-speed peristaltic pump |
Adjustable Liquid Injection Range | 0.04–13 mL/min; memory retention for flow rate, infinitely variable |
Atomization Power | 35W, infinitely adjustable |
Liquid Tank Material | PTFE |
Safety Protection | Non-contact low-liquid-level cutoff |
Carrier Gas Control | Adjustable float flow rate 60–600 mL/min |
Services | 12-month warranty with lifetime support |
Applications
Here are some typical applications for the Ultrasonic Nebulizer:
- Fuel Cell Production: Deposits catalyst and electrode materials to enhance fuel cell performance.
- ZnO Transparent Conductive Films: Deposits ZnO films for solar cells, touch screens, and displays.
- Nanomaterial Synthesis: Provides uniform nanoparticle deposition for electronics and sensors.
- Electrode Material Coating: Applies uniform coatings for batteries and supercapacitors.
- Composite Material Deposition: Improves conductivity, corrosion resistance, and other properties of composites.
- Photovoltaic Cell Fabrication: Deposits light-absorbing and conductive layers for efficient solar cells.
- Semiconductor Thin Film Deposition: Creates films for integrated circuits and electronic components.
- Corrosion-Resistant Coatings: Provides protective layers for aerospace and marine applications.
- Optoelectronic Device Fabrication: Supports production of LEDs, laser diodes, and other devices.
- Catalytic Layer Deposition: Deposits catalysts for air purification, water treatment, and environmental applications.
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