Ultrasonic Atomization CVD Furnace

This Ultrasonic Atomization CVD Furnace is an Aerosol-Assisted Chemical Vapor Deposition (AACVD) system (using liquid/gas aerosol precursors to grow on substrates), designed for applications such as fuel cells and ZnO transparent conductive films. It consists of three main modules: a microflow liquid high-precision delivery system, an ultrasonic atomization system, and a tube furnace with a maximum temperature of 1200°C. This technology is suitable for using non-volatile precursors and can be widely applied in the preparation of nanomaterials, electrode material coating, and composite materials.

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Description
SPECIFICATIONS

Ultrasonic Atomization CVD Furnace

Overview:

Main Features:

Liquid Flow Control System: High-precision delivery of intermediates, microflow liquid delivery; flow range: 0.04 to 36 ml/min.
Atomization Device: Equipped with a 1.7 MHz ultrasonic atomizer that can atomize liquids into fine particles and deliver them into the tube furnace.
Heating System (Customizable Tube Furnace): Maximum temperature up to 1200°C.

Technical Parameters of Ultrasonic Atomization CVD Furnace:

Power supply	AC220V 1.2KW
T-max	1200℃
Long-term Operating Temperature Range	300~1150℃
Heating Rate	1℃/H-20℃/Min
Heating Zone Length	200mm
High-Precision Peristaltic Pump	1.Speed range: 0.1 to 100 rpm, reversible; 2.Speed resolution: 0.1 rpm; 3.Speed adjustment: Membrane button; 4.Display mode: 4-digit LED shows current speed or flow rate; 5.Made of reinforced PP material, corrosion-resistant; 6.Flow rate: 0.04-13 ml/min; 7.Equipped with a full-speed button for fast emptying and filling; 8.Features power-off memory to save operating parameters promptly.
Atomizer	1.AC220V, 1.7 MHz ultrasonic atomizer;2.Liquid tank made of PTFE, corrosion-resistant, sealed with a silicone O-ring; 3.Atomization flow rate controlled by a gas flow meter; 4.Continuous atomization operation; 5.Flow rate: 0.04-13 ml/min.
Control System		1.Can store up to 15 temperature curves to avoid the hassle of repeated settings for different experiments; 2.More intuitive experimental process, easier operation; 3.Optional wireless control module for remote operation; 4.Features over-temperature alarm, thermocouple break warning, and leakage protection.
Heating Element		Mo-doped Fe-Cr-Al alloy.
Flow Control		Equipped with a standard float flowmeter, flow range 60-600 ml/min (other ranges can be customized upon request).
Net Weight	30KG
Usage Precautions	1.Do not open the furnace chamber when the temperature is ≥300°C to avoid injury. 2.When using the equipment, ensure that the pressure inside the tube does not exceed 0.125 MPa (absolute pressure) to prevent the sealing flange from being blown off due to excessive pressure. 3.When used in high vacuum conditions (10⁻³ Pa), the operating temperature should not exceed 800°C.
Service Support	One-year limited warranty with lifetime support (consumable parts such as processing tubes and O-rings are not covered under warranty and should be ordered separately under related products).

Applications:

The Ultrasonic Atomization CVD Furnace has several key applications, including:

1. Nanomaterial Preparation:

Suitable for synthesizing a wide range of nanomaterials, including nanoparticles, nanowires, and thin films, by facilitating controlled deposition using non-volatile precursors.

2. Electrode Material Coating:

Used for coating and composite materials, especially in applications like batteries, supercapacitors, and fuel cells, where uniform and thin coatings of electrode materials are essential.

3. Transparent Conductive Films:

Ideal for the growth of transparent conductive oxide (TCO) films, such as ZnO, which are used in optoelectronic devices like displays, touchscreens, and solar cells.

4. Catalyst Development:

Supports the fabrication and coating of catalysts, which are essential for chemical reactions in processes like catalysis, environmental remediation, and fuel cell development.

5. Sensor Fabrication:

Useful in producing thin films and nanostructures for sensors, including gas sensors, biosensors, and other chemical sensors, due to the precise control over material composition and structure.

6. Advanced Coating Technologies:

Enables advanced coating processes for various materials, including metals, ceramics, and polymers, enhancing their surface properties such as corrosion resistance, hardness, and wear resistance.

7. Research and Development:

Widely used in R&D environments for developing new materials, optimizing coating processes, and studying the properties of materials at high temperatures or under specific conditions.

These applications leverage the ability of the equipment to operate with non-volatile precursors, provide precise control over deposition parameters, and achieve uniform thin films and coatings.