1200.C Three Zone CVD Tube Furnace with Electrically Controlled Opening Door

This Three-Zone CVD Tube Furnace offers flexible combinations of gas supply and vacuum systems, making it suitable for various thin film deposition processes.

It is widely used in the semiconductor industry for depositing thin film materials, including large-area insulating materials and most metallic and metal alloy materials. Our complete CVD coating systems are ideal for use in material laboratories of universities, research institutes, environmental science fields, and more.