LJ13 Laboratory Vacuum Ion Sputtering Coater

The LJ13 Ion Sputtering Coater is designed for preparing samples for scanning electron microscopy, featuring simple structure, intuitive operation, and convenience. It allows ion sputtering of samples for scanning electron microscopy without requiring high vacuum levels, serving as essential equipment for coating samples for scanning electron microscopy.

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Description
SPECIFICATIONS

LJ13 Laboratory Vacuum Ion Sputtering Coater

Introduction:

Features and Benefits:

Equipped with a 4C silent vacuum pump, effectively reducing noise and enhancing the experimental experience.
Comes with a vacuum gauge and sputtering current meter in the sample chamber, providing real-time display and monitoring of instrument status.
Features edge rubber sealing rings to prevent the “edge collapse” phenomenon of the glass bell jar, ensuring long-term use without affecting the vacuum level of the sample sputtering chamber.
Equipped with a sputtering current controller and miniature vacuum valves. Combined with automatic control circuits, it enables easy control of vacuum chamber pressure, ionization current, and selection of ionization gases for optimal coating results.
Standard configuration includes a large-size pure gold target with a diameter of Φ58mm and thickness of 0.12mm, offering a larger sputtering range.

Technical Specifications:

Model	LJ13
	Control Panel: Vacuum Gauge: The vacuum level is indicated in units of mmHg or Pa on the dial, allowing easy reading of the vacuum level inside the chamber. Current Meter: Displays the sputtering current value in milliamperes (mA). Fine Adjustment Valve (Inflation Valve): Used to introduce gas into the chamber. Test Button: Used in conjunction with a needle valve to obtain the desired sputtering current value (less than 10mA). Sputtering Button: When the current from the “Test” button is less than 10mA, pressing the “Sputtering” button initiates ion sputtering of the sample. Time Setting Switch: Controls the duration of ion sputtering, with timing options ranging from 10 to 110 seconds. Power Switch: Controls the power supply to the instrument’s chassis and the mechanical pump.
	High-purity quartz vacuum chamber Φ130 (internal diameter 118) * 130mm Sample stage size: Φ42mm Adjustable sample stage height: 75mm
Electrical specifications	AC220V 120W
Chamber dimensions	Φ130（inner 118）*130mm
Sample stage size	High purityΦ42mm
Adjustable sample stage height	Adjustable sample stage height: 75mm
Sample temperature	＜35~50℃
Applicable target materials	Precious metals:Gold (Au),Platinum (Pt),Palladium (Pd),Gold-Platinum alloy (Au-Pt),Gold-Lead alloy (Au-Pb) Common metals:Copper (Cu),Tungsten (W),Silver (Ag),Chromium (Cr) Etc.
Sputtering rate	In general, the thickness of metal used for scanning samples is typically in the range of 100-300 Ångströms. Thickness can be determined empirically using the formula: d = KIVT where: d: coating thickness (in Ångströms) K: a constant depending on the sputtered metal and the gas used (when using a gold target and argon gas, K is 0.17; when using a gold target and air, K is 0.07). This distance is between the target and the sample. I: plasma current (in mA) V: applied voltage (in kV) T: time (in seconds). For example, using a gold target and argon gas with I as 8mA, T as 100 seconds, and V as 1 kV, then, d = KIVT = 0.17×8×I×100 = 136 Ångströms, which is approximately 1.36 Ångströms per second. The sputtering rate depends on the cleanliness of the sputtering system itself, so maintaining cleanliness in the workspace is crucial. The sputtering rate for other metal targets, such as platinum, is approximately half that of gold targets, while the sputtering rate for gold-platinum alloy targets is very close to that of gold targets.
Usage Precautions	Target Replacement: Disconnect the high-voltage and ground plugs on the sputtering cover plate, remove the sputtering cover plate, loosen the three top screws, remove the protective plate, and then unscrew the pressure ring to replace the new target. Vacuum Chamber Cleaning:Clean the chamber with anhydrous ethanol and acetone to ensure the system operates properly. Needle Valve Usage:After closing the needle valve, reverse-turn it two rotations to prevent the needle valve from becoming inflexible due to prolonged disuse. If there is no gas released into the chamber when opening the needle valve, fully turn the valve knob to the bottom before reopening it.
Standard Equipment	4C vacuum pump; 1 gold target: Φ58*0.12; One user manual. (Optional molecular pump)
Service Support	One-year warranty with lifelong service support
Net Weight & Dimensions	25KG