Clean Chamber Vacuum Furnace with Bottom Loading Design

Clean Chamber Vacuum Furnace with Ring Heating Bell and Top Auxiliary Heating

Clean Chamber Vacuum Furnace with Bottom Loading Design

The ZYLAB Clean Chamber Vacuum Furnace with Bottom Loading Design is specifically designed for high-temperature treatments in a vacuum or controlled atmosphere. Ideal for applications requiring uniform heating and staged temperature control, this furnace ensures that samples remain isolated from the external environment throughout the heating process, preventing contamination and oxidation.

Description
SPECIFICATIONS

ZYLAB Clean Chamber Vacuum Furnace with Bottom Loading Design

Introduction:

The furnace is equipped with a ring heating bell and top auxiliary heating, allowing precise temperature control and even heat distribution.

Key Features:

1. Vacuum Atmosphere Control

Vacuum Pump System: Equipped with a highly efficient vacuum pump, this system ensures the furnace reaches the desired vacuum level, providing an oxygen-free or controlled atmosphere for heating processes.
Atmosphere Control System: Inert gases such as argon or nitrogen can be introduced to maintain a stable atmosphere, preventing oxidation or unwanted reactions.

2. Ring Heating Bell Structure

Ring Heating Elements: The furnace utilizes ring-shaped heating elements surrounding the sample, providing even heat distribution for consistent temperatures at all points on the sample surface.
Bell Design: The bell-shaped structure enhances heating efficiency and makes sample loading and unloading easier while minimizing heat loss.

3. Top Auxiliary Heating

Top Heater: An additional top heater complements the ring heating zone, ensuring minimal temperature differences between the top and bottom of the sample, ideal for high-precision temperature control.

4. Precise Temperature Control

PID Control: Advanced PID algorithms provide precise temperature control, ensuring the heating curve aligns with preset parameters.
Real-time Monitoring: Equipped with high-accuracy temperature sensors to continuously monitor temperature fluctuations, ensuring stable and reliable process conditions.

5. Automatic Lifting Function

Electric Drive: The sample platform can be smoothly raised or lowered electrically, accommodating various sample sizes and weights.
Position Feedback: Integrated encoders or displacement sensors provide accurate position feedback, ensuring the sample is at the desired height.
Programmable Control: The system allows you to set lifting paths and speeds via a computer or touch screen interface, simplifying the operation and enhancing automation.

Applications:

Materials Science Research
Ideal for synthesizing advanced materials and studying material properties under high-temperature and controlled atmosphere conditions.
Metallurgical Industry
Used for metal melting, alloy preparation, and vacuum sintering, ensuring high material purity by preventing contamination from the external environment.
Semiconductor Manufacturing
Performs stress-relief annealing and wafer processing before chip packaging, enhancing electrical properties and improving product reliability.
Chemical Industry
Suitable for catalyst activation, organic synthesis, and other chemical reactions requiring precise temperature control and inert/vacuum atmospheres.
Laboratory and Academic Research
Provides a reliable and flexible heating platform for universities, research institutes, and laboratories conducting high-level scientific research.

Technical Specifications of Clean Chamber Vacuum Furnace:

Model	B1200
Power Supply	Three-phase 380V 50HZ
Rated Power	16.5KW
Number of Heating Zones	Two-point temperature control
Heating Structure	Annular heating bell + Top auxiliary heating
Temperature Measuring Element	K-type thermocouple Φ2*420mm
Max Temperature (Tmax)	1200°C
Rated Temperature	1100°C
Heating Rate	1°C/H – 20°C/Min
Furnace Zone Dimensions	φ350mm * 320mm * 2 (2 zones)
Quartz Sleeve Dimensions	φ300mm * 780mm
Three-Layer Quartz Tray Diameter	φ260mm (interlayer spacing 100mm)
Maximum Sample Size	φ200mm * 220mm
Furnace Dimensions	L1460mm * H2100mm * D1360mm
Float Flowmeter	0.5-8L/min
Furnace Weight	Approx. 610KG
Control System		Sintering process curve setting: Dynamic display of setting curve, multiple pre-stored sintering curves available for free configuration. Schedule sintering: Allows unattended operation for sintering curve execution. Real-time display of sintering power, voltage, etc., and record sintering data with export functionality for paperless recording. Remote control capability for real-time equipment status monitoring. Temperature calibration: Non-linear correction of temperature difference between main control and sample temperature throughout the sintering process.
Temperature Accuracy	±1°C
Heating Elements		HRE High-temperature alloy wire
High Purity Alumina Fiber Furnace Tray		Built-in gas preheating system. Automatic calibration of the furnace tray’s lifting origin. Uniform gas temperature output design. Pre-set high-temperature cooling rate. Adjustable horizontal and vertical lifting speed.
Clean Quartz Chamber		High-purity quartz inner liner. Annular heating element distribution for uniform temperature field. High-seal structure design prevents gas leakage and ensures high cleanliness level in the working chamber.
Gas Supply System		Furnace body reserves two float flowmeter inlets controlled by an electric control system and electromagnetic valve, then merged into a gas preheater before entering the reaction chamber. The post-reaction gases are exhausted through the top exhaust port.
Service Support	1-year warranty, lifetime support (consumable parts such as quartz products and sealing rings are not covered under warranty)

Why Choose ZYLAB Clean Chamber Vacuum Furnace?

High Purity Heating Environment
Precise Temperature and Atmosphere Control
Bottom Loading for Easy Handling and Safe Operation
Ideal for Research, Development, and Industrial Applications

Precautions for Equipment Operation：

High-Temperature Quartz Tube Warning
When the furnace temperature is ≥ 300°C, after moving the furnace chamber, do not touch the quartz tube at the previous furnace position to avoid burns or injury.
Do Not Open Furnace Chamber at High Temperature
When the furnace temperature is ≥ 300°C, do not open the furnace chamber, as this may result in serious injury due to high heat.
Pressure Limitation During Operation
During equipment operation, the internal pressure of the furnace tube must not exceed 0.125 MPa (absolute pressure) to prevent damage to the equipment due to excessive pressure.
Vacuum Use Temperature Limit
When operating under vacuum conditions, the maximum allowable temperature is 800°C. Exceeding this may cause equipment failure or damage.
Use of Gas Supply Cylinder
Gas cylinders typically contain high internal pressure. When introducing gas into the furnace tube, a pressure-reducing valve must be installed on the gas cylinder.
It is recommended to use a low-pressure regulator with a range of 0.01 MPa to 0.15 MPa, which provides more accurate and safer control during experiments.
Avoid Vacuum State at High Temperatures
When the furnace temperature exceeds 1000°C, the furnace tube must not be in a vacuum state. The internal pressure of the tube should be equal to atmospheric pressure, maintaining a normal pressure environment.
Quartz Tube Long-Term Temperature Limit
For high-purity quartz tubes, the recommended long-term operating temperature is ≤ 1100°C. Exceeding this temperature may shorten the service life or damage the tube.
Gas Valve Operation During Heating
It is not recommended to close both the exhaust valve and the inlet valve on the flange ends during heating experiments.
If the gas valves must be closed during sample heating, carefully monitor the pressure gauge at all times.
If the absolute pressure exceeds 0.15 MPa, the exhaust valve must be immediately opened to release pressure and prevent accidents, such as furnace tube rupture.

FAQ：

1. What are the benefits of using a vacuum atmosphere?

The vacuum atmosphere ensures that your samples are heated in an oxygen-free or controlled environment, preventing oxidation and unwanted chemical reactions. This is especially important for processing sensitive materials like metals, alloys, semiconductors, and advanced ceramics.

2. How does the ring heating bell structure work?

The furnace uses ring-shaped heating elements that surround the sample, ensuring even and consistent heat distribution. This design helps prevent hot spots and provides uniform heating, which is crucial for high-precision heat treatment processes.

3. What is the maximum temperature this furnace can reach?

The furnace can reach a maximum temperature of 1200°C, making it suitable for a wide range of high-temperature applications, including sintering, annealing, and catalyst activation.

4. Can the furnace be used for semiconductor processing?

Yes, the ZYLAB Clean Chamber Vacuum Furnace is commonly used in semiconductor processing, such as for annealing wafers or stress-relief treatments. The clean chamber and precise temperature control make it ideal for handling sensitive materials like semiconductor wafers and components.

5. How do I control the furnace’s lifting mechanism?

The furnace is equipped with an electric drive system that allows for smooth and precise lifting of the sample platform. You can program the lifting speed and path through the computer or touch screen interface, making the process automated and user-friendly.