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PECVD SystemPECVD (Plasma-Enhanced Chemical Vapor Deposition) System
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100-1200.C

Advanced Plasma-Enhanced Chemical Vapor Deposition PECVD Furnace System

Automatic In-and-Out Anti-Deposition Pyrolysis Furnace
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100-1200.C

Automatic Feeding and Discharging Anti-Deposition Pyrolysis Furnace

Oxygen-Free Sintering FurnaceAutomatic Inlet and Outlet Oxygen-Free Sintering Furnace
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100-1200.C

Automatic Feeding and Discharging Oxygen-Free Sintering Furnace

80L 1200.C Muffle FurnaceChamber Muffle Furnace (5)
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100-1200.C

Big Capacity 80L 1200.C Muffle Furnace

Chemical Vapor Deposition (CVD) SystemChemical Vapor Deposition (CVD) System (2)
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100-1200.C

Chemical Vapor Deposition (CVD) System

Clean Bottom Loading FurnaceBottom Loading Furnace
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100-1200.C

Clean Bottom Loading Furnace

1100.C Atmosphere Furnace1100.C Controlled Atmosphere Furnace
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100-1200.C

Continuing Operating Temperature 1100.C Atmosphere Furnace

1100.C Programmable Tube FurnaceProgrammable Tube Furnace
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100-1200.C

Continuing Operating Temperature 1100.C Programmable Tube Furnace Along All Standard Accessories

1200.C Box Furnace with Gas Inlet & Outlet1200.C Box Furnace
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100-1200.C

Customized 1200.C Box Furnace with Atmosphere Control System

Graphene Growth FurnaceGraphene Growth Furnace (2)
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100-1200.C

CVD Graphene Growth Furnace

Hot Press FurnaceHot Pressing Furnace
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100-1200.C

Detachable Hot Press Furnace

Dual Furnace PECVD System for Nanowire GrowthDual Furnace PECVD System
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100-1200.C

Dual Furnace PECVD System for Nanowire Growth

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