100-1200.C
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- Professional Supplier
- Large Stock
- Fast Delivery
- Custom Solutions Available
We offer a wide range of CVD furnaces, including LPCVD, APCVD, PECVD, MOCVD, FBCVD, AACVD, and more. We also provide customized solutions tailored to your specific application needs. Customization options include:
Heating zone diameter
Number of heating zones (1, 2, 3, 4, 5, or 6)
Atmosphere mixing systems
Vacuum systems
Automatic door opening mechanisms
Gas exhaust treatment systems
Let us know your requirements, and we will design the perfect system for you!
CVD Furnaces – FAQ
A CVD furnace is a specialized equipment used in the process of Chemical Vapor Deposition (CVD), where thin films or coatings are deposited onto substrates by chemical reactions of gaseous precursors at elevated temperatures.
CVD furnaces are widely used in semiconductor manufacturing, solar cell production, coating materials, and for the synthesis of carbon nanotubes, graphene, and other advanced materials.
In a CVD process, gaseous chemicals are introduced into the furnace chamber at high temperatures. These gases react on the surface of a substrate, forming solid films or coatings.
Common materials include metals, ceramics, polymers, semiconductors, and composites, which can be coated with films of metals, oxides, nitrides, and other materials.
Key parameters include temperature, gas flow rate, pressure, and reaction time, which must be carefully controlled for optimal deposition quality.
Yes, CVD furnaces are typically designed to operate at high temperatures, often ranging from 300°C to 1200°C, depending on the material being deposited.
Types of CVD furnaces include low-pressure CVD (LPCVD), atmospheric pressure CVD (APCVD), plasma-enhanced CVD (PECVD), and metal-organic CVD (MOCVD), Fluidized Bed CVD (FBCVD), Aerosol-Assisted CVD (AACVD), etc.
LPCVD operates under reduced pressure to allow for more uniform deposition, while APCVD operates at atmospheric pressure and is typically simpler and more cost-effective.
Substrates are usually placed on a heated platform or within a specific holder inside the furnace. The placement ensures even exposure to the reactive gases.
Common gases used in CVD include silane (SiH₄), methane (CH₄), ammonia (NH₃), hydrogen (H₂), nitrogen (N₂), and oxygen (O₂), depending on the material being deposited.
Special gas mixing systems can be integrated for precise control of gas flow and composition.
CVD furnaces typically operate at temperatures between 300°C and 1200°C, although this can vary depending on the specific process and materials.
We offer a wide range of CVD furnaces, including LPCVD, APCVD, PECVD, MOCVD, FBCVD, AACVD, and more. We also provide customized solutions tailored to your specific application needs. Customization options include:
Heating zone diameter
Number of heating zones (1, 2, 3, 4, 5, or 6)
Atmosphere mixing systems
Vacuum systems
Automatic door opening mechanisms
Gas exhaust treatment systems
Let us know your requirements, and we will design the perfect system for you!
Key Features of our CVD Furnaces:
- Intelligent System Controller with 7″ Color Touch Panel: Allows for easy control and programming of complex heating processes. Displays clear visual heating curves and can store temperature profiles.
- Vacuum-Formed Ceramic Fiber Chamber: Made from vacuum-formed ceramic fiber, enhancing both durability and heat retention.
- High-Quality Lining and Heating Elements: High-quality furnace linings and premium-grade heating elements to ensure reliable performance and longevity.
- Double-Layered Steel Casing with Fan Cooling: The double-layered steel casing, combined with fan cooling, provides improved thermal insulation and enhanced safety.
- Comprehensive Technical Support and Customization Options: Backed by extensive technical support and a wide range of customization options to meet the unique needs of your applications.
For more information on CVD furnaces, please read our article here.
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