Showing 25–36 of 61 results
800-1700.C
Continuing Operating Temperature 1600.C Programmable Tube Furnace Along All Standard Accessories
Accessories
Custom Quartz Wafer Holder for Wafer Processing
Customized 1700.C Box Furnace with Atmosphere Control System
100-1200.C
Detachable Hot Press Furnace
Dual Furnace PECVD System for Nanowire Growth
Dual Temperature Zone Rapid Annealing Slide Furnace
Dual-Furnace Sliding PECVD System for High-Precision Nanowire and Thin Film Deposition
Fast Heating PECVD System for Rapid Thin Film Deposition
Five-Temperature Zone CVD Furnace
Battery R&D
High Energy Dispersed Powder Uniform Mixing and Grinding Stirred Ball Mill
500-1500.C
High Temperature Tube Furnace 1500.C
High Temperature Tube Furnace 1700.C
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