Showing 25–36 of 70 results
100-1200.C
Chemical Vapor Deposition (CVD) System
500-1500.C
Continuing Operating Temperature 1400.C Programmable Tube Furnace Along All Standard Accessories
800-1700.C
Continuing Operating Temperature 1600.C Programmable Muffle Furnace Along All Standard Accessories
Continuing Operating Temperature 1600.C Programmable Tube Furnace Along All Standard Accessories
Accessories
Custom Quartz Wafer Holder for Wafer Processing
Customized 1700.C Box Furnace with Atmosphere Control System
Detachable Hot Press Furnace
Dual Furnace PECVD System for Nanowire Growth
Dual Temperature Zone Rapid Annealing Slide Furnace
Dual-Furnace Sliding PECVD System for High-Precision Nanowire and Thin Film Deposition
Fast Heating PECVD System for Rapid Thin Film Deposition
Five-Temperature Zone CVD Furnace
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