Showing 25–36 of 66 results
800-1700.C
Continuing Operating Temperature 1600.C Programmable Muffle Furnace Along All Standard Accessories
Continuing Operating Temperature 1600.C Programmable Tube Furnace Along All Standard Accessories
Accessories
Custom Quartz Wafer Holder for Wafer Processing
Customized 1700.C Box Furnace with Atmosphere Control System
100-1200.C
Detachable Hot Press Furnace
Dual Furnace PECVD System for Nanowire Growth
Dual Temperature Zone Rapid Annealing Slide Furnace
Dual-Furnace Sliding PECVD System for High-Precision Nanowire and Thin Film Deposition
Fast Heating PECVD System for Rapid Thin Film Deposition
Five-Temperature Zone CVD Furnace
Battery R&D
High Energy Dispersed Powder Uniform Mixing and Grinding Stirred Ball Mill
High Temperature Muffle Furnace with Nitrogen Gas Protection System
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