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Box FurnaceBox Furnace with Atmosphere Control System
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800-1700.C

Customized 1700.C Box Furnace with Atmosphere Control System

Hot Press FurnaceHot Pressing Furnace
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100-1200.C

Detachable Hot Press Furnace

Dual Furnace PECVD System for Nanowire GrowthDual Furnace PECVD System
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100-1200.C

Dual Furnace PECVD System for Nanowire Growth

Sliding PECVD SystemSliding PECVD System (2)
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100-1200.C

Dual-Furnace Sliding PECVD System for High-Precision Nanowire and Thin Film Deposition

Fast Heating PECVD SystemFast Heating PECVD System for Rapid Thin Film Deposition
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100-1200.C

Fast Heating PECVD System for Rapid Thin Film Deposition

Five-Temperature Zone CVD FurnaceFive-Temperature Zone CVD Furnace (3)
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100-1200.C

Five-Temperature Zone CVD Furnace

36L 1700.C Chamber Furnace1700.C Muffle Furnace (3)
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800-1700.C

High Temperature 36L 1700.C Chamber Furnace

Muffle Furnace with Nitrogen Gas Protection SystemMuffle Furnace with Nitrogen Gas
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800-1700.C

High Temperature Muffle Furnace with Nitrogen Gas Protection System

Tube Furnace 1500.CHigh Temperature Tube Furnace 1500.C
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500-1500.C

High Temperature Tube Furnace 1500.C

Tube Furnace 1700.CHigh Temperature Tube Furnace 1700.C
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800-1700.C

High Temperature Tube Furnace 1700.C

Horizontal Hydrogen Reduction FurnaceHorizontal Reduction Furnace
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100-1200.C

High-Efficiency Horizontal Hydrogen Reduction Furnace

Three-Zone PECVD System (2)Three-Zone PECVD System
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100-1200.C

High-Performance Three-Zone PECVD System for Precision Thin Film Deposition

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