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PECVD SystemPECVD (Plasma-Enhanced Chemical Vapor Deposition) System
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100-1200.C

Advanced Plasma-Enhanced Chemical Vapor Deposition PECVD Furnace System

1700.C Muffle Furnace1700.C Muffle Furnace (3)
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800-1700.C

Big Capacity 36L 1700.C Muffle Furnace

80L 1200.C Muffle FurnaceChamber Muffle Furnace (5)
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100-1200.C

Big Capacity 80L 1200.C Muffle Furnace

Box Type Lab Sintering Furnace 1600°C
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800-1700.C

Box Type Lab Sintering Furnace 1600°C

Bridgman Crystal Growth FurnaceCrystal Growth Furnace
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Crystal Growth Furnaces

Bridgman Crystal Growth Furnace

1100.C Atmosphere Furnace1100.C Controlled Atmosphere Furnace
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100-1200.C

Continuing Operating Temperature 1100.C Atmosphere Furnace

1400.C Atmosphere Furnace (2)1400.C Atmosphere Furnace
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500-1500.C

Continuing Operating Temperature 1400.C Atmosphere Furnace

1400.C Programmable Muffle FurnaceProgrammable Muffle Furnace
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500-1500.C

Continuing Operating Temperature 1400.C Programmable Muffle Furnace Along All Standard Accessories

1600.C Atmosphere FurnaceControlled Atmosphere Furnace with Chiller
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800-1700.C

Continuing Operating Temperature 1600.C Atmosphere Furnace

1600.C Programmable Muffle FurnaceProgrammable Muffle Furnace
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800-1700.C

Continuing Operating Temperature 1600.C Programmable Muffle Furnace Along All Standard Accessories

1600.C Programmable Tube Furnace1600.C Tube Furnace
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800-1700.C

Continuing Operating Temperature 1600.C Programmable Tube Furnace Along All Standard Accessories

Quartz Wafer SupportQuartz Wafer Holder
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Accessories

Custom Quartz Wafer Holder for Wafer Processing

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