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60L Planetary Ball MillPlanetary Ball Mill
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Ceramics and Target Material Preparation

60L Planetary Ball Mill

80L Planetary Ball MillPlanetary Ball Mill
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Ceramics and Target Material Preparation

80L Planetary Ball Mill

8L Planetary Ball MillPlanetary Ball Mill
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Ceramics and Target Material Preparation

8L Planetary Ball Mill

PECVD SystemPECVD (Plasma-Enhanced Chemical Vapor Deposition) System
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100-1200.C

Advanced Plasma-Enhanced Chemical Vapor Deposition PECVD Furnace System

Chemical Vapor Deposition (CVD) SystemChemical Vapor Deposition (CVD) System (2)
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100-1200.C

Chemical Vapor Deposition (CVD) System

1100.C Programmable Tube FurnaceProgrammable Tube Furnace
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100-1200.C

Continuing Operating Temperature 1100.C Programmable Tube Furnace Along All Standard Accessories

1400.C Programmable Tube Furnace1400.C Programmable Tube Furnace (2)
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500-1500.C

Continuing Operating Temperature 1400.C Programmable Tube Furnace Along All Standard Accessories

1600.C Programmable Tube Furnace1600.C Tube Furnace
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800-1700.C

Continuing Operating Temperature 1600.C Programmable Tube Furnace Along All Standard Accessories

Hot Press FurnaceHot Pressing Furnace
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100-1200.C

Detachable Hot Press Furnace

Dual Furnace PECVD System for Nanowire GrowthDual Furnace PECVD System
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100-1200.C

Dual Furnace PECVD System for Nanowire Growth

Sliding PECVD SystemSliding PECVD System (2)
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100-1200.C

Dual-Furnace Sliding PECVD System for High-Precision Nanowire and Thin Film Deposition

Fast Heating PECVD SystemFast Heating PECVD System for Rapid Thin Film Deposition
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100-1200.C

Fast Heating PECVD System for Rapid Thin Film Deposition