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Showing 13–23 of 23 results

Five-Temperature Zone CVD FurnaceFive-Temperature Zone CVD Furnace (3)
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100-1200.C

Five-Temperature Zone CVD Furnace

1500.C Horizontal Tube Furnace1500.C Tube Furnace (3)
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500-1500.C

High Temperature 1500.C Horizontal Tube Furnace

Tube Furnace 1500.CHigh Temperature Tube Furnace 1500.C
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500-1500.C

High Temperature Tube Furnace 1500.C

Tube Furnace 1700.CHigh Temperature Tube Furnace 1700.C
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800-1700.C

High Temperature Tube Furnace 1700.C

Three-Zone PECVD System (2)Three-Zone PECVD System
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100-1200.C

High-Performance Three-Zone PECVD System for Precision Thin Film Deposition

Tube Furnace for Wafer ProcessingTube Furnace for Wafer Processing (2)
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100-1200.C

Laboratory Vacuum Atmosphere Tube Furnace for Wafer Processing

Large Size Multi Zone Tubular Furnace(1)Large Size Multi Zone Tubular Furnace
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100-1200.C

Large Size 3 Zone Tubular Furnace

Vibrating Rotary Sintering FurnaceVibrating Rotary Sintering Furnace (2)
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100-1200.C

Medium-sized Vacuum Atmosphere Vibrating Rotary Sintering Furnace 1200℃

Rotary Sintering Furnace 1200℃
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100-1200.C

Production Type Vacuum Atmosphere Vibrating Rotary Sintering Furnace 1200.C

Rapid Thermal Processing FurnaceRapid Thermal Processing Furnace
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100-1200.C

Rapid Thermal Processing Furnace

Ultrasonic Atomization CVD FurnaceUltrasonic Atomization CVD Furnace (2)
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100-1200.C

Ultrasonic Atomization CVD Furnace