Monocrystalline Annealing Furnace

Why Does Monocrystalline Silicon Require Annealing?

The primary purpose of annealing is to improve the crystal quality of monocrystalline silicon, relieve internal stress, repair defects, and optimize its physical and electronic properties, thereby meeting the application requirements in the semiconductor and photovoltaic fields.

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Structure of Calcination Rotary Furnace

Calcination Heat Treatment Technology and Equipment for Powder Materials

Calcination heat treatment technology for powder materials is a key material preparation process widely used in the production of lithium battery materials, ceramics, catalysts, magnetic materials, and high-performance alloys. Through high-temperature heating, calcination induces physical or chemical changes in powder materials to achieve specific structures, phase transitions, and properties.

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Tube Furnace Applications

Analysis of Tube Furnace: Applications, Advantages, and Operations

A tube furnace is a type of high-temperature electric furnace commonly used in laboratories and industries, primarily for various applications such as material synthesis, heat treatment, and atmosphere control experiments. Its basic structure includes a heating element, a hollow tubular chamber (usually made of quartz or ceramic), and a temperature control system. The tube furnace generates a high-temperature environment inside the tube for heating treatment.

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Fluidized Bed FBCVD Furnace

Fluidized Bed Technology

Fluidized bed technology is a versatile and widely used method in various industrial processes, particularly in chemical engineering, material science, and energy production.

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Ultrasonic Atomization CVD Furnace

All about Aerosol-Assisted Chemical Vapor Deposition (AACVD) System

Aerosol-Assisted Chemical Vapor Deposition (AACVD) is a specialized technique used for the deposition of thin films and coatings on various substrates. Unlike traditional Chemical Vapor Deposition (CVD), which relies solely on gaseous precursors, AACVD utilizes aerosols—finely dispersed droplets of a precursor solution suspended in a carrier gas—to transport the precursor materials to the deposition zone.

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